K. Ismail

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Publications

Citations

3.2K

H-Index

Active since

1988

Affiliations

IBM Research - Thomas J. Watson Research Center(Current)

Massachusetts Institute of Technology

IBM (United States)

Cairo University

University of Illinois Urbana-Champaign

K. Ismail is an author at IBM Research - Thomas J. Watson Research Center specializing in semiconductor materials, materials science, and semiconductor physics.

Publications per year

1988–2025

Publications

Extremely high electron mobility in Si/SiGe modulation-doped heterostructures

K. Ismail, M. Arafa, K. L. Saenger et al. · Applied Physics Letters · 1995 · 223 citations

Natural Sciences, Materials Science, Physics +17

Electron transport properties of Si/SiGe heterostructures: Measurements and device implications

K. Ismail, Shelby F. Nelson, J. O. Chu et al. · Applied Physics Letters · 1993 · 169 citations

Engineering, Materials Engineering, Materials Science +17

High hole mobility in SiGe alloys for device applications

K. Ismail, J. O. Chu, B.S. Meyerson · Applied Physics Letters · 1994 · 162 citations

Engineering, Materials Science, Physics +17

High electron mobility in modulation-doped Si/SiGe

K. Ismail, B.S. Meyerson, P. J. Wang · Applied Physics Letters · 1991 · 155 citations

Engineering, Materials Science, Physics +17

Identification of a Mobility-Limiting Scattering Mechanism in Modulation-Doped Si/SiGe Heterostructures

K. Ismail, F. K. LeGoues, K. L. Saenger et al. · Physical Review Letters · 1994 · 153 citations

Engineering, Materials Engineering, Materials Science +17

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