Shaunee Cheng

Pitch doubling through dual-patterning lithography challenges in integration and litho budgets

Mircea Dusa, John Quaedackers, Olaf F. A. Larsen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 87 citations

Wafer Scale Processing, Engineering, Electron-beam Lithography +13

Double patterning for 32nm and below: an update

Jo Finders, Mircea Dusa, Bert Vleeming et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 42 citations

Cdu Control, Physical Design (Electronics), Array Computing +15

Sources of overlay error in double patterning integration schemes

David Laidler, Philippe Leray, Koen D’havé et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 29 citations

Numerical Analysis, Engineering, Industrial Engineering +20

Diffraction based overlay metrology: accuracy and performance on front end stack

Philippe Leray, Shaunee Cheng, Daniel Kandel et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 24 citations

Front End Stack, Engineering, Measurement +19

Natural EUV mask blank defects: evidence, timely detection, analysis and outlook

Dieter Van den Heuvel, R. Jonckheere, John Magana et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 21 citations

Engineering, Electron-beam Lithography, Microscopy +19