Shaunee Cheng - Concepedia

Author

Shaunee Cheng

IMEC

Also Known As

Shaunee Cheng

Publications

343

Citations

H-Index

Concepts

All Affiliations

IMEC ASML (Netherlands)Imec the Netherlands

About

Shaunee Cheng is an author at IMEC specializing in engineering, 3d printing, and computer engineering.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	7	7	236
2	Applied Physics	5	5	165
3	Computer Engineering	5	5	128
4	Education	2	2	40
5	Medicine	1	1	21

Shaunee Cheng

Publications

247

Citations

H-Index

Page 1

	Year	Citations
Pitch doubling through dual-patterning lithography challenges in integration and litho budgets Mircea Dusa, John Quaedackers, Olaf F. A. Larsen, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Wafer Scale ProcessingEngineeringElectron-beam LithographyBeam LithographyMicrofabrication	2007	87
Double patterning for 32nm and below: an update Jo Finders, Mircea Dusa, Bert Vleeming, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Cdu ControlPhysical Design (Electronics)Array ComputingEngineeringElectron-beam Lithography	2008	42
Sources of overlay error in double patterning integration schemes David Laidler, Philippe Leray, Koen D’havé, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Numerical AnalysisEngineeringIndustrial EngineeringDigital ManufacturingAdvanced Manufacturing	2008	29
Diffraction based overlay metrology: accuracy and performance on front end stack Philippe Leray, Shaunee Cheng, Daniel Kandel, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Front End StackEngineeringMeasurementOptic DesignOptical Testing	2008	24
Natural EUV mask blank defects: evidence, timely detection, analysis and outlook Dieter Van den Heuvel, R. Jonckheere, John Magana, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyMicroscopyMechanical EngineeringPathology	2010	21
Split and design guidelines for double patterning Vincent Wiaux, Staf Verhaegen, Shaunee Cheng, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectronic Design AutomationComputer ArchitecturePattern TransferComputer-aided Design	2008	17
Progress in EUV lithography towards manufacturing from an exposure tool perspective Jan Hermans, David Laidler, Philippe Foubert, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Optical MaterialsEngineeringElectron-beam LithographyTarget FabricationExposure Tool Perspective	2012	16
Achieving optimum diffraction based overlay performance Philippe Leray, David Laidler, Shaunee Cheng, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2010	11

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