John Magana

Repair of natural EUV reticle defects

R. Jonckheere, T. Bret, Dieter Van den Heuvel et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 42 citations

Defect Tolerance, Electrical Engineering, Wafer Scale Processing +15

Commercial molecular beam epitaxy production of high quality SrTiO3 on large diameter Si substrates

Xing Gu, D. Lubyshev, J. Batzel et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2009 · 38 citations

Engineering, Thin Film Process Technology, Silicon On Insulator +16

Natural EUV mask blank defects: evidence, timely detection, analysis and outlook

Dieter Van den Heuvel, R. Jonckheere, John Magana et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 21 citations

Engineering, Electron-beam Lithography, Microscopy +19

Evidence of printing blank-related defects on EUV masks missed by blank inspection

R. Jonckheere, Dieter Van den Heuvel, T. Bret et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 21 citations

Engineering, Ml Defects, Electron-beam Lithography +13

EUV mask infrastructure readiness and gaps for TD and HVM

Ted Liang, John Magana, K. K. Chakravorty et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 16 citations

Mask Cycle, Feasibility Phase, Engineering +4