David Laidler

Sources of overlay error in double patterning integration schemes

David Laidler, Philippe Leray, Koen D’havé et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 29 citations

Numerical Analysis, Engineering, Industrial Engineering +20

Wafer-shape based in-plane distortion predictions using Superfast 4G metrology

Leon van Dijk, Jeffrey Mileham, Ilja Malakhovsky et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 28 citations

Wafer Distortions, Engineering, Physical Design (Electronics) +16

Anomalous Diffractions in the Hull-Debye-Scherrer Spectrum of Graphite

A. Taylor, David Laidler · Nature · 1940 · 26 citations · Full text

Engineering, Physics, Natural Sciences +9

A 0.314μm/sup 2/ 6T-SRAM cell build with tall triple-gate devices for 45nm node applications using 0.75NA 193nm lithography

A. Nackaerts, Monique Ercken, S. Demuynck et al. · 2005 · 22 citations

Engineering, Vlsi Design, Node Applications +16

Characterization of overlay mark fidelity

Mike Adel, Mark Ghinovker, J. Poplawski et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 18 citations

Engineering, Industrial Engineering, Mechanical Engineering +19