Carsten Hartig - Concepedia

Author

Carsten Hartig

IBM (United States)

Also Known As

Carsten Hartig

Publications

208

Citations

H-Index

Concepts

All Affiliations

IBM (United States)GlobalFoundries (Germany)GlobalFoundries (United States)Nova Measuring Instruments (Israel)Nova Measuring Instruments (United States)

About

Carsten Hartig is an author at IBM (United States) specializing in measurement, instrumentation, and engineering.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	6	6	154
2	Education	5	5	138
3	Applied Physics	4	4	122
4	Computer Engineering	4	4	111
5	Medicine	1	1	16

Carsten Hartig

Publications

154

Citations

H-Index

Page 1

	Year	Citations
A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM Alok Vaid, Bin Bin Yan, Yun Tao Jiang, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyMeasurementMicroscopyEducation	2011	65
In-line E-beam wafer metrology and defect inspection: the end of an era for image-based critical dimensional metrology? New life for defect inspection Eric Solecky, Oliver D. Patterson, Andrew Stamper, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyMeasurementMicroscopyDefect Inspection	2013	27
Hybrid metrology solution for 1X node technology Alok Vaid, Alexander Elia, Mark Kelling, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyMeasurementEducationComputer-aided Design	2012	17
Time-dependent electron-beam-induced photoresist shrinkage effects Benjamin Bunday, Aaron Cordes, Carsten Hartig, Journal of Micro/Nanolithography MEMS and MOEMS EngineeringElectron MicroscopyPhysicsMicroscopyMeasurement	2012	16
Implementation of hybrid metrology at HVM fab for 20nm and beyond Alok Vaid, Lokesh Subramany, Givantha Iddawela, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringMeasurementDigital ManufacturingOptical MetrologyEducation	2013	15
Scatterometry as technology enabler for embedded SiGe process Alok Vaid, Rohit Pal, Matthew Sendelbach, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyMeasurementEducationSilicon On Insulator	2008	14

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