N. Samoto

A novel electron-beam exposure technique for 0.1-μm T-shaped gate fabrication

N. Samoto, Yoichi Makino, K. Onda et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1990 · 34 citations

Electrical Engineering, Electronic Devices, Engineering +14

8 nm Wide Line Fabrication in PMMA on Si Wafers by Electron Beam Exposure

Fumiaki Emoto, Kenji Gamo, Susumu Namba et al. · Japanese Journal of Applied Physics · 1985 · 28 citations

Engineering, Electron-beam Lithography, Microscopy +18

Gate length scaling for Al/sub 0.2/Ga/sub 0.8/N/GaN HJFETs: two-dimensional full band Monte Carlo simulation including polarization effect

Yuji Ando, W. Contrata, N. Samoto et al. · IEEE Transactions on Electron Devices · 2000 · 26 citations

Wide-bandgap Semiconductor, Engineering, Power Electronics +17

Electron focusing with multiparallel GaAs-AlGaAs wires defined by damageless processing

Fumiyuki Nihey, Kazuo Nakamura, Masaaki Kuzuhara et al. · Applied Physics Letters · 1990 · 24 citations

Electron Focusing, Wide-bandgap Semiconductor, Electrical Engineering +11

Molecular-beam epitaxial growth of InAs/GaAs superlattices on GaAs substrates and its application to a superlattice channel modulation-doped field-effect transistor

H. Toyoshima, K. Onda, E. Mizuki et al. · Journal of Applied Physics · 1991 · 21 citations

Engineering, Semiconductor Nanostructures, Semiconductors +16