David O’Meara

Perspective: New process technologies required for future devices and scaling

Robert D. Clark, Kandabara Tapily, K.H. Yu et al. · APL Materials · 2018 · 192 citations · Full text

Engineering, Electrical Engineering, Materials Science +17

Clad Nd:YAG fibers for laser applications

Michel J. F. Digonnet, C. J. Gaeta, David O’Meara et al. · Journal of Lightwave Technology · 1987 · 49 citations

Natural Sciences, Materials Engineering, Materials Science +17

Comparison of B2O3 and BN deposited by atomic layer deposition for forming ultrashallow dopant regions by solid state diffusion

Steven Consiglio, Robert D. Clark, David O’Meara et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2015 · 24 citations

Natural Sciences, Materials Engineering, Materials Science +17

Self-aligned quadruple patterning integration using spacer on spacer pitch splitting at the resist level for sub-32nm pitch applications

Angélique Raley, Sophie Thibaut, Nihar Mohanty et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 24 citations

Engineering, Electrical Engineering, Materials Science +17

Challenges and mitigation strategies for resist trim etch in resist-mandrel based SAQP integration scheme

Nihar Mohanty, Elliott Franke, Eric Liu et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 17 citations

Engineering, Electrical Engineering, Materials Engineering +16