52
Publications
2.6K
Citations
29
H-Index
1976
Active since
Affiliations
G. Scilla is an author at IBM Research - Thomas J. Watson Research Center specializing in engineering, applied physics, and materials science.
Top concepts
EngineeringApplied PhysicsMaterial ScienceElectrical EngineeringSemiconductorsMaterials EngineeringMicroelectronicsChemistrySurface ScienceCrystalline Defects
Publications per year
1976–2003
52
52
Controlled carbon doping of GaAs by metalorganic vapor phase epitaxy
T. F. Kuech, M. A. Tischler, P.-J. Wang et al. · Applied Physics Letters · 1988 · 180 citations
Semiconductors, Materials Science, Electrical Engineering +10
Boron, phosphorus, and arsenic diffusion in TiSi2
P. Gas, V. R. Deline, F. M. d’Heurle et al. · Journal of Applied Physics · 1986 · 100 citations · Full text
Hydrogen plasma induced defects in silicon
S.J. Jeng, G. S. Oehrlein, G. Scilla · Applied Physics Letters · 1988 · 95 citations
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