Roderik van Es

EUV lithography performance for manufacturing: status and outlook

Alberto Pirati, Rudy Peeters, Daniel Smith et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 90 citations

Engineering, Electrical Engineering, Manufacturing Engineering +15

Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner

Mark van de Kerkhof, Hans Jasper, Leon Levasier et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 83 citations

Engineering, Manufacturing Engineering, Digital Fabrication +12

Performance overview and outlook of EUV lithography systems

Alberto Pirati, Rudy Peeters, Daniel Smith et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 52 citations

Engineering, Electrical Engineering, Materials Science +8

EUV for HVM: towards an industrialized scanner for HVM NXE3400B performance update

Mark van de Kerkhof, Arthur Minnaert, Marco Pieters et al. · 2018 · 44 citations

Engineering, Manufacturing Engineering, Digital Fabrication +12

0.33 NA EUV systems for high volume manufacturing

Christophe Smeets, Nico Benders, Frank Bornebroek et al. · 2023 · 13 citations

Engineering, Computer Engineering, Electrical Engineering +11