R. Rippstein

Fabrication of fully scaled 0.5-μm <i>n</i>-type metal–oxide semiconductor test devices using synchrotron x-ray lithography: Overlay, resist processes, and device fabrication

J. P. Silverman, V. Dimilia, D. Katcoff et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1988 · 20 citations

Engineering, Electrical Engineering, Materials Science +16

Imaging capabilities of proximity x-ray lithography at 70-nm ground rules

Azalia A. Krasnoperova, R. Rippstein, Alex Flamholz et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 13 citations

Engineering, Electrical Engineering, Manufacturing Engineering +13

Performance of a wide-field flux delivery system for synchrotron x-ray lithography

J. P. Silverman, Charles N. Archie, James Oberschmidt et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1993 · 12 citations

Natural Sciences, Manufacturing Engineering, Facility Layout +7

Novel single mirror condenser for x-ray lithography beam lines

Jiabei Xiao, F. Cerrina, R. Rippstein · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1994 · 10 citations

Natural Sciences, Physics, Biomedical Imaging +11

Application of synchrotron x-ray lithography to fabricate fully scaled 0.5 μm complementary metal–oxide semiconductor devices and circuits

L. K. Wang, J. P. Silverman, David E. Seeger et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1989 · 10 citations

Engineering, Electrical Engineering, Manufacturing Engineering +17