D. Katcoff

The use of simulation in semiconductor technology development

Daniel C. Cole, E. M. Buturla, S. Furkay et al. · Solid-State Electronics · 1990 · 31 citations

Engineering, Process Simulation Model, Software Process Simulation +7

Fabrication of fully scaled 0.5-μm <i>n</i>-type metal–oxide semiconductor test devices using synchrotron x-ray lithography: Overlay, resist processes, and device fabrication

J. P. Silverman, V. Dimilia, D. Katcoff et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1988 · 20 citations

Engineering, Resist Processes, Electron-beam Lithography +21

Thermal and mechanical model of x-ray lithography masks under short pulse irradiation

Iqbal Shareef, Juan R. Maldonando, D. Katcoff · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1989 · 10 citations

Engineering, X-ray Spectroscopy, Electron-beam Lithography +24

Application of synchrotron x-ray lithography to fabricate fully scaled 0.5 μm complementary metal–oxide semiconductor devices and circuits

L. K. Wang, J. P. Silverman, David E. Seeger et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1989 · 10 citations

Engineering, Electron-beam Lithography, Optoelectronic Devices +16