Joo-On Park

Progress in EUV lithography toward manufacturing

Seong-Sue Kim, Roman Chalykh, Hoyeon Kim et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 48 citations

Materials Science, Electrical Engineering, Engineering +15

22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool

Patrick Naulleau, Christopher N. Anderson, Jerrin Chiu et al. · Microelectronic Engineering · 2009 · 31 citations

Ultraviolet Light, Photonics, Engineering +11

Characterization of promising resist platforms for sub-30-nm HP manufacturability and EUV CAR extendibility study

Chawon Koh, Jacque H. Georger, Liping Ren et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 18 citations

Engineering, Electron-beam Lithography, Resist Collapse +19

The analysis of EUV mask defects using a wafer defect inspection system

Kyoungyong Cho, Joo-On Park, Chang-Min Park et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 15 citations

Electrical Engineering, Wafer Scale Processing, Engineering +14

Assessment of EUV resist readiness for 32-nm hp manufacturing and extendibility study of EUV ADT using state-of-the-art resist

Chawon Koh, Liping Ren, Jacque H. Georger et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 15 citations

Short Wavelength Optic, Engineering, Electron-beam Lithography +17