Zsolt Tökei

Size-Dependent Resistivity in Nanoscale Interconnects

D. Josell, Sywert Brongersma, Zsolt Tökei · Annual Review of Materials Research · 2009 · 275 citations

Engineering, Copper Conductors, Interconnect (Integrated Circuits) +18

Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper

Liang Wen, Philippe Roussel, Olalla Varela Pedreira et al. · ACS Applied Materials & Interfaces · 2016 · 138 citations

Future Logic Scaling: Towards Atomic Channels and Deconstructed Chips

Srikanth Samavedam, Julien Ryckaert, Eric Beyne et al. · 2020 · 109 citations

Engineering, Vlsi Design, Logic Scaling +21

Highly Scaled Ruthenium Interconnects

Shibesh Dutta, Shreya Kundu, Anshul Gupta et al. · IEEE Electron Device Letters · 2017 · 90 citations

Materials Science, Stanene, Electrical Engineering +10

Alternative metals for advanced interconnects

Christoph Adelmann, Liang Wen, Antony Premkumar Peter et al. · 2014 · 87 citations

Materials Science, Materials Engineering, Electrical Engineering +14