In-Yong Kang

The analysis of EUV mask defects using a wafer defect inspection system

Kyoungyong Cho, Joo-On Park, Chang-Min Park et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 15 citations

Engineering, Electrical Engineering, Manufacturing Engineering +16

Characterization of Ru layer for capping/buffer application in EUVL mask

Tae Geun Kim, Seung Yoon Lee, Chung Yong Kim et al. · Microelectronic Engineering · 2006 · 15 citations

Natural Sciences, Materials Engineering, Materials Science +6

A study of defects on EUV masks using blank inspection, patterned mask inspection, and wafer inspection

Sungmin Huh, Liping Ren, David Y. Chan et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 14 citations

Engineering, Manufacturing Engineering, Manufacturing Processes +15

Printability and inspectability of programmed pit defects on the masks in EUV lithography

In-Yong Kang, Hwan-Seok Seo, Byung-Sup Ahn et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 13 citations

Engineering, Materials Engineering, Materials Science +17

Novel absorber stack for minimizing shadow effect in extreme ultraviolet mask

Tae Geun Kim, Byung Hun Kim, In-Yong Kang et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2006 · 11 citations

Natural Sciences, Materials Engineering, Materials Science +15