Mark J. Maslow

Patterning control strategies for minimum edge placement error in logic devices

Jan Mulkens, M. M. Hanna, Bram Slachter et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 46 citations

Engineering, Computer Engineering, Manufacturing Engineering +14

Holistic approach for overlay and edge placement error to meet the 5nm technology node requirements

Jan Mulkens, Michael Kubis, Wim Tel et al. · 2018 · 33 citations

Engineering, Electrical Engineering, Manufacturing Engineering +13

SAQP and EUV block patterning of BEOL metal layers on IMEC's iN7 platform

Joost Bekaert, Paolo Di Lorenzo, Ming Mao et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 26 citations

Engineering, Computer Engineering, Materials Science +8

Improving exposure latitudes and aligning best focus through pitch by curing M3D phase effects with controlled aberrations

Joern-Holger Franke, Joost Bekaert, Víctor M. Blanco Carballo et al. · 2019 · 21 citations

Medicine, Vision Science, Digital Imaging +13

Toward a universal resist dissolution model for lithography simulation

Stewart A. Robertson, Chris A. Mack, Mark J. Maslow · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2001 · 16 citations

Natural Sciences, Materials Engineering, Materials Science +13