Stephanie Watts Butler

A comparison of principal component analysis, multiway principal component analysis, trilinear decomposition and parallel factor analysis for fault detection in a semiconductor etch process

Barry M. Wise, Neal B. Gallagher, Stephanie Watts Butler et al. · Journal of Chemometrics · 1999 · 290 citations

Fault Diagnosis, Engineering, Process Instrumentation +21

Supervisory run-to-run control of polysilicon gate etch using in situ ellipsometry

Stephanie Watts Butler, Jerry A. Stefani · IEEE Transactions on Semiconductor Manufacturing · 1994 · 224 citations

Supervisory Run-to-run Control, Engineering, Process Instrumentation +14

Automatic control in microelectronics manufacturing: Practices, challenges, and possibilities

Thomas F. Edgar, Stephanie Watts Butler, W.J. Campbell et al. · Automatica · 2000 · 205 citations

Engineering, Automation, Process Control +4

Development and Benchmarking of Multivariate Statistical Process Control Tools for a Semiconductor Etch Process: Improving Robustness through Model Updating

Neal B. Gallagher, Barry M. Wise, Stephanie Watts Butler et al. · IFAC Proceedings Volumes · 1997 · 84 citations

Engineering, Improving Robustness, Industrial Engineering +13

Spatial characterization of wafer state using principal component analysis of optical emission spectra in plasma etch

David A. White, Duane S. Boning, Stephanie Watts Butler et al. · IEEE Transactions on Semiconductor Manufacturing · 1997 · 55 citations

Optical Materials, Environmental Monitoring, Engineering +22