Concepedia

Author

Volker Boegli

Lawrence Berkeley National Laboratory

Also Known As

V. Boegli, Volker A. Boegli, Volker Boegli

24

Publications

365

Citations

9

H-Index

27

Concepts

All Affiliations

Lawrence Berkeley National LaboratoryMassachusetts Institute of TechnologyIBM Research - Thomas J. Watson Research Center
VB

About

Volker Boegli is an author at Lawrence Berkeley National Laboratory specializing in engineering, applied physics, and microelectronics.

Top Concepts

#ConceptH-IndexPublicationsCitations

1

Engineering

8

8

299

2

Applied Physics

7

7

246

3

Electrical Engineering

5

5

206

4

Computer Engineering

3

3

90

5

Materials Science

2

2

110

Volker Boegli

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8

Publications

299

Citations

8

H-Index

YearCitations

Electron-beam-based photomask repair

Klaus Edinger, Hans Becht, Johannes Bihr,

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

2004

78

Electron beam lithography digital pattern generator and electronics for generalized curvilinear structures

Erik H. Anderson, Volker Boegli, Lawrence P. Muray

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

1995

61

Magnification of mask fabricated fibre Bragg gratings

John D. Prohaska, E. Snitzer, S. A. Rishton,

Electronics Letters

1993

53

Spatial-phase-locked electron-beam lithography: Initial test results

J. Mariano Ferrera, Vincent V. Wong, S. A. Rishton,

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

1993

32

Metrology of electron-beam lithography systems using holographically produced reference samples

Erik H. Anderson, Volker Boegli, Mark L. Schattenburg,

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

1991

24

Demonstration of damage-free mask repair using electron beam-induced processes

Ted Liang, Alan R. Stivers, M. J. Penn,

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

2004

22

Automatic mark detection in electron beam nanolithography using digital image processing and correlation

Volker Boegli, D. P. Kern

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

1990

16

A novel electron-beam-based photomask repair tool

Klaus Edinger, Hans Becht, Rainer Becker,

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

2003

13

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