D. Miles

Selective chemical etching of polycrystalline SiGe alloys with respect to Si and SiO2

F.S. Johnson, D. Miles, Douglas T. Grider et al. · Journal of Electronic Materials · 1992 · 57 citations

Engineering, Materials Engineering, Materials Science +14

Salicides: materials, scaling and manufacturability issues for future integrated circuits (invited)

J. A. Kittl, Wei-Tsun Shiau, Q. Z. Hong et al. · Microelectronic Engineering · 2000 · 48 citations

Natural Sciences, Materials Engineering, Materials Science +4

A novel nickel SALICIDE process technology for CMOS devices with sub-40 nm physical gate length

J.P. Lu, D. Miles, Junfa Zhao et al. · 2003 · 29 citations

Engineering, Electrical Engineering, Materials Engineering +13

An enhanced 90nm high performance technology with strong performance improvements from stress and mobility increase through simple process changes

R. Khamankar, H. Bu, C. Bowen et al. · 2004 · 21 citations

Engineering, Electrical Engineering, Microelectronics +14