Wei-Tsun Shiau

Salicides: materials, scaling and manufacturability issues for future integrated circuits (invited)

J. A. Kittl, Wei-Tsun Shiau, Q. Z. Hong et al. · Microelectronic Engineering · 2000 · 48 citations

Natural Sciences, Materials Engineering, Materials Science +4

Performance of 70 nm strained-silicon CMOS devices

J. R. Hwang, J.H. Ho, S.M. Ting et al. · 2004 · 31 citations

Engineering, Electrical Engineering, Materials Science +17

A 1.2 V, 0.1 μm gate length CMOS technology: design and process issues

M. Rödder, S. V. Hattangady, Ning Yu et al. · 2002 · 29 citations

Engineering, Electrical Engineering, Microelectronics +16

A 1.2V, sub-0.09 μm gate length CMOS technology

M. Mehrotra, Jianghai Hu, Amit Kumar C Jain et al. · 2003 · 23 citations

Engineering, Electrical Engineering, Electronic Materials +16

Hot carrier degradation in novel strained-Si nMOSFETs

Meng Lu, S. Chiang, A. Liu et al. · 2004 · 19 citations

Engineering, Electrical Engineering, Materials Science +17