Salicides: materials, scaling and manufacturability issues for future integrated circuits (invited)

Comparison of transformation to low-resistivity phase and agglomeration of TiSi/sub 2/ and CoSi/sub 2/

J. B. Lasky, James Nakos, O.J. Cain et al. · IEEE Transactions on Electron Devices · 1991 · 346 citations

Natural Sciences, Materials Engineering, Materials Science +17

Reduction of the C54–TiSi2 phase transformation temperature using refractory metal ion implantation

R. Mann, G. L. Miles, Thomas A. Knotts et al. · Applied Physics Letters · 1995 · 124 citations

Engineering, Materials Engineering, Materials Science +12

Kinetics and nucleation model of the C49 to C54 phase transformation in TiSi2 thin films on deep-sub-micron <i>n</i>+ type polycrystalline silicon lines

J. A. Kittl, Douglas A. Prinslow, Pushkar P. Apte et al. · Applied Physics Letters · 1995 · 104 citations

Natural Sciences, Materials Engineering, Materials Science +17

Enhanced formation of the C54 phase of TiSi2 by an interposed layer of molybdenum

A. Mouroux, S.-L. Zhang, Wlodek Kaplan et al. · Applied Physics Letters · 1996 · 96 citations

Engineering, Materials Engineering, Materials Science +17

Self-aligned Ti and Co silicides for high performance sub-0.18 μm CMOS technologies

J. A. Kittl, Q. Z. Hong · Thin Solid Films · 1998 · 59 citations

Engineering, Electrical Engineering, Materials Science +13