G. L. Miles

Reduction of the C54–TiSi2 phase transformation temperature using refractory metal ion implantation

R. Mann, G. L. Miles, Thomas A. Knotts et al. · Applied Physics Letters · 1995 · 124 citations

Materials Science, Ion Implantation, Engineering +6

Low temperature formation of C54–TiSi2 using titanium alloys

C. Cabral, L. A. Clevenger, J. M. E. Harper et al. · Applied Physics Letters · 1997 · 73 citations

Materials Engineering, Materials Science, High Temperature Materials +14

The evolution of IBM CMOS DRAM technology

E.L. Adler, J. DeBrosse, Steven J. Holmes et al. · IBM Journal of Research and Development · 1995 · 51 citations

Hardware Security, Electrical Engineering, Engineering +14

A half-micron CMOS logic generation

Charles W. Koburger, William F. Clark, J. Adkisson et al. · IBM Journal of Research and Development · 1995 · 41 citations

Hardware Security, Half-micron Lithography, Electrical Engineering +15

Interaction of TiSi2 layers with polycrystalline Si

L. R. Zheng, L. S. Hung, Shiping Feng et al. · Applied Physics Letters · 1986 · 38 citations

Materials Science, Silicide Film, Engineering +14