Concepedia

Selective chemical etching of polycrystalline SiGe alloys with respect to Si and SiO2

F.S. Johnson, D. Miles, Douglas T. Grider, J. J. Wortman

Journal of Electronic Materials · 1992 · 57 citations · 13 references

DOI

Concepts

References

13

Formation of Copper Thin Films by a Low Kinetic Energy Particle Process

Tadahiro Ohmi, Tatsuyuki Saito, M. Otsuki et al. · Journal of The Electrochemical Society · 1991 · 79 citations

, , +17

A Mechanistic Study of Silicon Etching in  NH 3 /  H 2 O 2 Cleaning Solutions

J. E. A. M. van den Meerakker, M. H. M. van der Straaten · Journal of The Electrochemical Society · 1990 · 63 citations

, , +17

Selective low-pressure chemical vapor deposition of Si1−<i>x</i>Ge<i>x</i> alloys in a rapid thermal processor using dichlorosilane and germane

Y. Zhong, Mehmet C. Öztürk, Douglas T. Grider et al. · Applied Physics Letters · 1990 · 52 citations

, , +15

Chemical Etching of Germanium with H<sub>3</sub>PO<sub>4</sub>–H<sub>2</sub>O<sub>2</sub>–H<sub>2</sub>O Solution

S. Kagawa, Takashi Mikawa, T. Kaneda · Japanese Journal of Applied Physics · 1982 · 40 citations

, , +17

Chemical Etching of Germanium in Solutions of HF, HNO[sub 3], H[sub 2]O, and HC[sub 2]H[sub 3]O[sub 2]

B. Schwartz, Harry Robbins · Journal of The Electrochemical Society · 1964 · 27 citations

, , +17