Douglas T. Grider

Selective chemical etching of polycrystalline SiGe alloys with respect to Si and SiO2

F.S. Johnson, D. Miles, Douglas T. Grider et al. · Journal of Electronic Materials · 1992 · 57 citations

Engineering, Materials Engineering, Materials Science +14

Selective low-pressure chemical vapor deposition of Si1−<i>x</i>Ge<i>x</i> alloys in a rapid thermal processor using dichlorosilane and germane

Y. Zhong, Mehmet C. Öztürk, Douglas T. Grider et al. · Applied Physics Letters · 1990 · 52 citations

Natural Sciences, Materials Engineering, Materials Science +15

Rapid thermal chemical vapor deposition of germanium on silicon and silicon dioxide and new applications of ge in ULSI technologies

Mehmet C. Öztürk, Douglas T. Grider, J. J. Wortman et al. · Journal of Electronic Materials · 1990 · 37 citations

Engineering, Materials Engineering, Materials Science +14

Manufacturability issues in rapid thermal chemical vapor deposition

Mehmet C. Öztürk, F. Y. Sorrell, J. J. Wortman et al. · IEEE Transactions on Semiconductor Manufacturing · 1991 · 25 citations

Natural Sciences, Manufacturing Engineering, Materials Science +12

Rapid thermal chemical vapor deposition of in-situ boron doped polycrystalline SIxGe1-x

Mahesh K. Sanganeria, Douglas T. Grider, Mehmet C. Öztürk et al. · Journal of Electronic Materials · 1992 · 17 citations

Natural Sciences, Materials Engineering, Materials Science +9