M. Kerber

Reliability screening of high-k dielectrics based on voltage ramp stress

A. Kerber, L. Pantisano, A. Veloso et al. · Microelectronics Reliability · 2007 · 91 citations

Natural Sciences, Materials Engineering, Materials Science +15

Ultra-thick gate oxides: charge generation and its impact on reliability

Udo Schwalke, M. Pölzl, Thomas Sekinger et al. · Microelectronics Reliability · 2001 · 68 citations

Engineering, Electrical Engineering, Materials Science +14

Influence of soft breakdown on NMOSFET device characteristics

T. Pompl, H. Wurzer, M. Kerber et al. · 2003 · 58 citations

Engineering, Electrical Engineering, Circuit Theory +16

Reliability of Al2O3-doped ZrO2 high-k dielectrics in three-dimensional stacked metal-insulator-metal capacitors

Dayu Zhou, Uwe Schroeder, Jin Xu et al. · Journal of Applied Physics · 2010 · 39 citations

Natural Sciences, Materials Engineering, Materials Science +17

Investigation of ultra-thin gate oxide reliability behavior by separate characterization of soft breakdown and hard breakdown

T. Pompl, H. Wurzer, M. Kerber et al. · 2002 · 34 citations

Engineering, Electrical Engineering, Materials Science +17