17
Publications
491
Citations
15
H-Index
1995
Active since
T. Rödle is an author at NXP (Netherlands) specializing in engineering, applied physics, and electrical engineering.
Top concepts
EngineeringApplied PhysicsElectrical EngineeringMicroelectronicsMaterial ScienceMaterials EngineeringNanoelectronicsSurface SciencePower ElectronicsElectronic Engineering
Publications per year
1995–2010
17
17
Vincent Desmaris, M. Rudziński, Niklas Rorsman et al. · IEEE Transactions on Electron Devices · 2006 · 77 citations
Wide-bandgap Semiconductor, Electrical Engineering, Engineering +12
Gudjón Gudjónsson, Halldór Ólafsson, Fredrik Allerstam et al. · IEEE Electron Device Letters · 2005 · 55 citations
Semiconductor Technology, Electrical Engineering, 4H-sic Mosfets +9
Ion-beam-induced amorphization of 6H-SiC
W. Bolse, J. Conrad, T. Rödle et al. · Surface and Coatings Technology · 1995 · 41 citations
Materials Engineering, Ion-beam-induced Amorphization, Ion Implantation +4
Irradiation effects in α-SiC studied via RBS-C, Raman-scattering and surface profiling
J. Conrad, T. Rödle, Thomas Weber et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 1996 · 30 citations
Materials Science, Surface Profiling, Surface Characterization +7
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