Matt Hankinson

Integrated real-time and run-to-run control of etch depth in reactive ion etching

Matt Hankinson, Tyrone L. Vincent, Keki B. Irani et al. · IEEE Transactions on Semiconductor Manufacturing · 1997 · 51 citations

Electrical Engineering, Engineering, Industrial Engineering +11

Run-to-Run Critical Dimension and Sidewall Angle Lithography Control Using the PROLITH Simulator

Chadi El Chemali, J.S. Freudenberg, Matt Hankinson et al. · IEEE Transactions on Semiconductor Manufacturing · 2004 · 26 citations

Prolith Simulator, Physical Design (Electronics), Engineering +12

Correlating scatterometry to CD-SEM and electrical gate measurements at the 90-nm node using TMU analysis

Matthew Sendelbach, Charles N. Archie, Bill Banke et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 21 citations

Engineering, Measurement, In-line Metrology +16

Critical dimension control of a plasma etch process by integrating feedforward and feedback run-to-run control

Chadi El Chemali, J.S. Freudenberg, Matt Hankinson et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2003 · 14 citations

Engineering, Flow Control, Critical Dimension Control +16