Wenli Collison

A three-dimensional model for inductively coupled plasma etching reactors: Azimuthal symmetry, coil properties, and comparison to experiments

Mark J. Kushner, Wenli Collison, Michael Grapperhaus et al. · Journal of Applied Physics · 1996 · 112 citations

Electrical Engineering, Icp Reactor, Engineering +13

Studies of the low-pressure inductively-coupled plasma etching for a larger area wafer using plasma modeling and Langmuir probe

Wenli Collison, Tom Ni, Michael Barnes · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1998 · 76 citations

Langmuir Probe, Electrical Engineering, Engineering +14

Segmental Semi-Markov Models for Endpoint Detection in Plasma Etching

Xianping Ge, Padhraic Smyth, Wenli Collison et al. · 2000 · 36 citations

Electron-beam controlled radio frequency discharges for plasma processing

Mark J. Kushner, Wenli Collison, D. N. Ruzic · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1996 · 36 citations

Electrical Engineering, Plasma Electronics, Engineering +9

Ion drag effects in inductively coupled plasmas for etching

Wenli Collison, Mark J. Kushner · Applied Physics Letters · 1996 · 34 citations

Engineering, Fluid Mechanics, Plasma Science +17