Concepedia

Author

Wenli Collison

Lam Research (United States)

Also Known As

Collison, Wenli, W.Z. Collison, Wenli Collison, Wenli Z. Collison

21

Publications

373

Citations

9

H-Index

39

Concepts

All Affiliations

Lam Research (United States)University of Illinois Urbana-Champaign
WC

About

Wenli Collison is an author at Lam Research (United States) specializing in engineering, electrical engineering, and microelectronics.

Top Concepts

#ConceptH-IndexPublicationsCitations

1

Engineering

8

8

326

2

Electrical Engineering

6

6

282

3

Applied Physics

5

5

266

4

Biomedical Engineering

1

1

13

5

Computer Engineering

1

1

14

Wenli Collison

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9

Publications

362

Citations

9

H-Index

YearCitations

A three-dimensional model for inductively coupled plasma etching reactors: Azimuthal symmetry, coil properties, and comparison to experiments

Mark J. Kushner, Wenli Collison, Michael Grapperhaus,

Journal of Applied Physics

1996

112

Studies of the low-pressure inductively-coupled plasma etching for a larger area wafer using plasma modeling and Langmuir probe

Wenli Collison, Tom Ni, Michael Barnes

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

1998

76

Segmental Semi-Markov Models for Endpoint Detection in Plasma Etching

Xianping Ge, Padhraic Smyth, Wenli Collison,

2000

36

Electron-beam controlled radio frequency discharges for plasma processing

Mark J. Kushner, Wenli Collison, D. N. Ruzic

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

1996

36

Ion drag effects in inductively coupled plasmas for etching

Wenli Collison, Mark J. Kushner

Applied Physics Letters

1996

34

HBr concentration and temperature measurements in a plasma etch reactor using diode laser absorption spectroscopy

S. I. Chou, Douglas S. Baer, Ronald K. Hanson,

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

2001

31

Critical dimension control of a plasma etch process by integrating feedforward and feedback run-to-run control

Chadi El Chemali, J.S. Freudenberg, Matt Hankinson,

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

2003

14

Design and performance of a step and repeat imprinting machine

Ian McMackin, Philip Schumaker, Daniel Babbs,

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

2003

13

Conceptual design of advanced inductively coupled plasma etching tools using computer modeling

Wenli Collison, Mark J. Kushner

IEEE Transactions on Plasma Science

1996

10

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