Tom Ni

Studies of the low-pressure inductively-coupled plasma etching for a larger area wafer using plasma modeling and Langmuir probe

Wenli Collison, Tom Ni, Michael Barnes · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1998 · 76 citations

Natural Sciences, Electrical Engineering, Physics +17

Segmental Semi-Markov Models for Endpoint Detection in Plasma Etching

Xianping Ge, Padhraic Smyth, Wenli Collison et al. · 2000 · 36 citations

Engineering, Electrical Engineering, Physics +16

HBr concentration and temperature measurements in a plasma etch reactor using diode laser absorption spectroscopy

S. I. Chou, Douglas S. Baer, Ronald K. Hanson et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2001 · 31 citations

Natural Sciences, Chemistry, Physics +17

Optical self-absorption technique for qualitative measurement of excited-state densities in plasma reactors

Paul Miller, Gregory A. Hebner, Robert Jarecki et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1998 · 17 citations

Natural Sciences, Physics, Optics +15

Critical dimension control of a plasma etch process by integrating feedforward and feedback run-to-run control

Chadi El Chemali, Matt Hankinson, Wenli Collison et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2003 · 14 citations

Engineering, Electrical Engineering, Manufacturing Engineering +16