Chadi El Chemali

Improved short channel device characteristics with stress relieved pre-oxide (SRPO) and a novel tantalum carbon alloy metal gate/HfO/sub 2/ stack

H.‐H. Tseng, C. Capasso, J. Schaeffer et al. · 2005 · 35 citations

Materials Engineering, Electrical Engineering, Engineering +12

Run-to-Run Critical Dimension and Sidewall Angle Lithography Control Using the PROLITH Simulator

Chadi El Chemali, J.S. Freudenberg, Matt Hankinson et al. · IEEE Transactions on Semiconductor Manufacturing · 2004 · 26 citations

Prolith Simulator, Physical Design (Electronics), Engineering +12

Critical dimension control of a plasma etch process by integrating feedforward and feedback run-to-run control

Chadi El Chemali, J.S. Freudenberg, Matt Hankinson et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2003 · 14 citations

Engineering, Flow Control, Critical Dimension Control +16

Multizone uniformity control of a chemical mechanical polishing process utilizing a pre- and postmeasurement strategy

Chadi El Chemali, James Moyne, Kareemullah Khan et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2000 · 13 citations

Engineering, Industrial Engineering, Mechanical Engineering +21