Evaluation of Megasonic Cleaning for Sub-90nm Technologies

Guy Vereecke, Frank Holsteyns, Sophia Arnauts, +8

Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena

Materials ScienceChemical EngineeringEngineeringNanoscale ChemistryFragile Structures +13

Validation of vapor phase decomposition–droplet collection–total reflection X-ray fluorescence spectrometry for metallic contamination analysis of silicon wafers

David Hellin, Jens Rip, Sophia Arnauts, +3

Spectrochimica Acta Part B Atomic Spectroscopy

Materials ScienceChemical EngineeringSilicon WafersEngineeringAnalytical Instrumentation +9

Wet-Chemical Approaches for Atomic Layer Etching of Semiconductors: Surface Chemistry, Oxide Removal and Reoxidation of InAs (100)

Dennis H. van Dorp, Sophia Arnauts, Frank Holsteyns, +1

ECS Journal of Solid State Science and Technology

Study of InP Surfaces after Wet Chemical Treatments

Daniel Cuypers, Dennis H. van Dorp, Massimo Tallarida, +7

ECS Journal of Solid State Science and Technology

Wet Chemical Etching of InP for Cleaning Applications

Daniel Cuypers, Stefan De Gendt, Sophia Arnauts, +2

ECS Journal of Solid State Science and Technology

Materials ScienceChemical EngineeringOxide Formation/oxide DissolutionEngineeringMicrofabrication +12

Quantitative Analysis of Trace Metals in Silicon Nitride Films by a Vapor Phase Decomposition/Solution Collection Approach

Guy Vereecke, Marc Schaekers, K. Verstraete, +3

Journal of The Electrochemical Society

EngineeringThin Film Process TechnologySilicon On InsulatorMetallic ImpuritiesChemical Engineering +15

Nanoscale etching of III-V semiconductors in acidic hydrogen peroxide solution: GaAs and InP, a striking contrast in surface chemistry

Dennis H. van Dorp, Sophia Arnauts, Mikko Laitinen, +4

Applied Surface Science

Materials ScienceSemiconductorsEngineeringSurface ScienceApplied Physics +7

Nanoscale Etching of In_0.53Ga_0.47As in H₂O₂/HCl Solutions for Advanced CMOS Processing

Dennis H. van Dorp, Sophia Arnauts, Daniel Cuypers, +4

ECS Journal of Solid State Science and Technology

EngineeringNanoscale EtchingChemistryAdvanced CmosNanoelectronics +18

Implementation of the IMEC-Clean in advanced CMOS manufacturing

Marc Meuris, Sophia Arnauts, Ingrid Cornelissen, +9

Electrical EngineeringPhysical Design (Electronics)EngineeringVlsi DesignAdvanced Cmos Manufacturing +13

Wet Chemical Etching of InP for Cleaning Applications

Dennis H. van Dorp, Daniel Cuypers, Sophia Arnauts, +3

ECS Journal of Solid State Science and Technology

EngineeringNative OxideM HclChemistryWet Chemical Etching +14