Massimo Tallarida

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Active since

2004

Affiliations

Brandenburg University of Technology Cottbus-Senftenberg(Current)

ALBA Synchrotron (Spain)

University of Helsinki

University of Tartu

KU Leuven

Massimo Tallarida is an author at Brandenburg University of Technology Cottbus-Senftenberg specializing in natural sciences, materials science, and materials engineering.

ORCID

Publications per year

2004–2025

Publications

Unification of Catalytic Water Oxidation and Oxygen Reduction Reactions: Amorphous Beat Crystalline Cobalt Iron Oxides

Arindam Indra, Prashanth W. Menezes, Nastaran Ranjbar Sahraie et al. · Journal of the American Chemical Society · 2014 · 660 citations

Natural Sciences, Chemistry, Materials Science +17

Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films

Jörg Haeberle, Karsten Henkel, Hassan Gargouri et al. · Beilstein Journal of Nanotechnology · 2013 · 112 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

A facile corrosion approach to the synthesis of highly active CoOxwater oxidation catalysts

Arindam Indra, Prashanth W. Menezes, Chittaranjan Das et al. · Journal of Materials Chemistry A · 2017 · 90 citations

Natural Sciences, Chemical Engineering, Chemistry +16

Thin manganese films on Si(111)-(7 × 7): electronic structure and strain in silicide formation

A. Ashok Kumar, Massimo Tallarida, Martin‐Leo Hansmann et al. · Journal of Physics D Applied Physics · 2004 · 62 citations

Natural Sciences, Materials Science, Physics +17

Atomic Layer Deposition of Ruthenium Films from (Ethylcyclopentadienyl)(pyrrolyl)ruthenium and Oxygen

Kaupo Kukli, Marianna Kemell, Esa Puukilainen et al. · Journal of The Electrochemical Society · 2011 · 56 citations

Natural Sciences, Materials Engineering, Materials Science +17

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