Concepedia

Validation of vapor phase decomposition–droplet collection–total reflection X-ray fluorescence spectrometry for metallic contamination analysis of silicon wafers

David Hellin, Jens Rip, Sophia Arnauts, Stefan De Gendt, P. Mertens, Chris Vinckier

Spectrochimica Acta Part B Atomic Spectroscopy · 2004 · 30 citations · 16 references

DOI

Concepts

References

16

High-κ gate dielectrics: Current status and materials properties considerations

G. D. Wilk, Robert M. Wallace, J. Anthony · Journal of Applied Physics · 2001 · 5.8K citations

, , +16

Determination of the critical thickness and the sensitivity for thin-film analysis by total reflection X-ray fluorescence spectrometry

R. Klockenkämper, Alex von Bohlen · Spectrochimica Acta Part B Atomic Spectroscopy · 1989 · 141 citations

, , +10

A Method of Quantitative Contamination with Metallic Impurities of the Surface of a Silicon Wafer

Masataka Hourai, Toshio Naridomi, Yasunori Oka et al. · Japanese Journal of Applied Physics · 1988 · 113 citations

, , +17

Total reflection X-ray fluorescence spectrometry for quantitative surface and layer analysis

U. Weisbrod, R. Gutschke, J. Knoth et al. · Applied Physics A · 1991 · 93 citations

, , +11

Ultra-trace analysis of metallic contaminations on silicon wafer surfaces by vapour phase decomposition/total reflection X-ray fluorescence (VPD/TXRF)

Christian Neumann, P. Eichinger · Spectrochimica Acta Part B Atomic Spectroscopy · 1991 · 80 citations

, , +11