Lloyd C. Litt

<title>Manufacturing considerations for implementation of scatterometry for process monitoring</title>

John A. Allgair, David C. Benoit, Robert R. Hershey et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2000 · 16 citations

Engineering, Process Instrumentation, Industrial Engineering +25

Flare and its impact on low-k 1 KrF and ArF lithography

Bruno M. La Fontaine, Mircea Dusa, Alden Acheta et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2002 · 15 citations

Engineering, Electron-beam Lithography, Optical Testing +20

SEMATECH's nanoImprint program: a key enabler for nanoimprint introduction

Lloyd C. Litt, Matt Malloy · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 14 citations

Engineering, Electron-beam Lithography, Biomedical Engineering +17

Cost of ownership for future lithography technologies

Andrew J. Hazelton, Andrea Wüest, Greg Hughes et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 14 citations

Electrical Engineering, Wafer Scale Processing, Engineering +15

Step and flash imprint lithography for semiconductor high volume manufacturing?

Matthew Malloy, Lloyd C. Litt · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 14 citations

Engineering, Electron-beam Lithography, Wafer Scale Processing +17