Mark Slezak

Design of Protective Topcoats for Immersion Lithography

Robert D. Allen, Phillip J. Brock, Linda K. Sundberg et al. · Journal of Photopolymer Science and Technology · 2005 · 17 citations · Full text

Engineering, Materials Engineering, Materials Science +11

IBM-JSR 193-nm negative tone resist: polymer design, material properties, and lithographic performance

Kaushal Patel, Margaret C. Lawson, Pushkara R. Varanasi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 12 citations

Natural Sciences, Materials Engineering, Materials Science +16

High-refractive index material design for ArF immersion lithography

Taiichi Furukawa, Takanori Kishida, Takashi Miyamatsu et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 11 citations

Natural Sciences, Materials Engineering, Materials Science +11

193nm single layer photoresists: defeating tradeoffs with a new class of fluoropolymers

Pushkara R. Varanasi, Ranee W. Kwong, Mahmoud Khojasteh et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 11 citations

Natural Sciences, Materials Engineering, Materials Science +13

Rational design in cyclic olefin resists for sub-100-nm lithography

Wenjie Li, Pushkara R. Varanasi, Margaret C. Lawson et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 11 citations

Natural Sciences, Materials Engineering, Materials Science +17