Margaret C. Lawson

Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes

Darı́o L. Goldfarb, Arpan P. Mahorowala, Gregg M. Gallatin et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 86 citations

Natural Sciences, Materials Engineering, Materials Science +17

Performance of tri-layer process required for 22 nm and beyond

Yayi Wei, Martin Glodde, Hakeem Yusuff et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 23 citations

Engineering, Materials Engineering, Materials Science +14

Fluoro-alcohol materials with tailored interfacial properties for immersion lithography

Daniel P. Sanders, Linda K. Sundberg, Ratnam Sooriyakumaran et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 18 citations

Engineering, Materials Engineering, Materials Science +17

Impact of thin resist processes on post-etch LER

Arpan P. Mahorowala, Darı́o L. Goldfarb, Karen Temple et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 13 citations

Engineering, Manufacturing Engineering, Materials Science +17

IBM-JSR 193-nm negative tone resist: polymer design, material properties, and lithographic performance

Kaushal Patel, Margaret C. Lawson, Pushkara R. Varanasi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 12 citations

Natural Sciences, Materials Engineering, Materials Science +16