Evaluation of EUV resist materials for use at the 32 nm half-pitch node

Thomas I. Wallow, Craig Higgins, Robert L. Brainard, +6

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Short Wavelength OpticOptical MaterialsEngineeringElectron-beam LithographyOptical Testing +22

An exploratory study of the conduction mechanism of hydrogenated nanocrystalline silicon films

Yuliang He, Yayi Wei, Zheng Guozhen, +2

Journal of Applied Physics

Exploratory StudyHigh ConductivityEngineeringSilicon On InsulatorSemiconductor Nanostructures +19

Enhanced ultraviolet photoconductivity in semiconducting ZnGa2O4 thin films

Yong Eui Lee, D. P. Norton, J. D. Budai, +1

Journal of Applied Physics

Materials ScienceUndoped FilmsIi-vi SemiconductorPhotoluminescenceEngineering +11

Chemically amplified resists resolving 25 nm 1:1 line: space features with EUV lithography

James W. Thackeray, Roger A. Nassar, Robert L. Brainard, +6

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringElectron-beam LithographySpace FeaturesOptoelectronic DevicesIntegrated Circuits +18

Pathway to sub-30nm Resolution in EUV Lithography

James W. Thakerlay, Roger A. Nassar, Kathleen Spear-Alfonso, +11

Journal of Photopolymer Science and Technology

EngineeringElectron-beam LithographyMicroscopyBeam LithographyKey Resist Factors +14

Semisupervised Hotspot Detection With Self-Paced Multitask Learning

Ying Chen, Yibo Lin, Tianyang Gai, +3

IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems

EngineeringMachine LearningSimulation OverheadMachine Learning ToolEducation +18

Fast source mask co-optimization method for high-NA EUV lithography

Ziqi Li, Lisong Dong, Xu Ma, +1

Opto-Electronic Advances

Semi-supervised hotspot detection with self-paced multi-task learning

Ying Chen, Yibo Lin, Tianyang Gai, +3

EngineeringMachine LearningSimulation OverheadMachine Learning ToolData Science +16

Performance of tri-layer process required for 22 nm and beyond

Yayi Wei, Martin Glodde, Hakeem Yusuff, +5

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Materials ScienceElectrical EngineeringWafer Scale ProcessingEngineeringHigh Silicon Content +13

Compensation of EUV lithography mask blank defect based on an advanced genetic algorithm

Ruixuan Wu, Lisong Dong, Xu Ma, +1

Optics Express

Electron-beam LithographyBeam LithographyLithography SystemLithography ImageAdvanced Genetic Algorithm +2