Versatile synthesis of nanometer sized hollow silica spheresElectronic supplementary information (ESI) available: experimental; IR and XPS; AFM, SEM and TEM images. See http://www.rsc.org/suppdata/cc/b2/b212811j/

Jeroen J. L. M. Cornelissen, Eric F. Connor, Ho‐Cheol Kim, +6

Chemical Communications

EngineeringNanostructured PolymerFunctionalized Polystyrene LatexesChemistryHollow Silica Spheres +16

Templating of Silsesquioxane Cross‐Linking Using Unimolecular Self‐Organizing Polymers

Eric F. Connor, Linda K. Sundberg, Ho‐Cheol Kim, +8

Angewandte Chemie International Edition

EngineeringNanoporous MaterialPorous MembranePorous PolymerChemistry +16

Liquid immersion lithography: evaluation of resist issues

William D. Hinsberg, Gregory M. Wallraff, Carl E. Larson, +12

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Materials ScienceResist MaterialsEngineeringSpecific ResistancePhysics +12

A Fundamental Study on Dissolution Behavior of High-Resolution Molecular Glass Photoresists

Anuja De Silva, Linda K. Sundberg, Hiroshi Ito, +3

Chemistry of Materials

EngineeringGlass-forming LiquidGlass MaterialChemistryResist Materials +15

Quantitative depth profiling of photoacid generators in photoresist materials by near-edge X-ray absorption fine structure spectroscopy

Vivek M. Prabhu, Sharadha Sambasivan, Daniel A. Fischer, +2

Applied Surface Science

Materials ScienceX-ray CrystallographyPhotoacid GeneratorsPhotoresist MaterialsX-ray Spectroscopy +10

Templating of Silsesquioxane Cross‐Linking Using Unimolecular Self‐Organizing Polymers

Eric F. Connor, Linda K. Sundberg, Ho‐Cheol Kim, +8

Angewandte Chemie

Materials SciencePolymer MaterialEngineeringCross-linkDer Polymergröße Ab +11

Fluoro-alcohol materials with tailored interfacial properties for immersion lithography

Daniel P. Sanders, Linda K. Sundberg, Ratnam Sooriyakumaran, +6

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Materials ScienceChemical EngineeringEngineeringWater Contact AngleImmersion Lithography +12

Sub-50nm half-pitch imaging with a low activation energy chemically amplified photoresist

G. M. Wallraff, David R. Medeiros, M. Sanchez, +14

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Optical MaterialsEngineeringElectron-beam LithographyMicroscopyImage Blur +26

Design of Protective Topcoats for Immersion Lithography

Robert D. Allen, Phillip J. Brock, Linda K. Sundberg, +7

Journal of Photopolymer Science and Technology

EngineeringChemical EngineeringImmersion LithographyCorrosionElectronic Packaging +16

Formulation Graphs for Mapping Structure-Composition of Battery Electrolytes to Device Performance

Vidushi Sharma, Maxwell J. Giammona, Dmitry Yu. Zubarev, +5

Journal of Chemical Information and Modeling