Arpan P. Mahorowala

Plasma-surface kinetics and feature profile evolution in chlorine etching of polysilicon

Jane P. Chang, Arpan P. Mahorowala, Herbert H. Sawin · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1998 · 111 citations

Materials Science, Chemical Engineering, Ion Implantation +15

Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes

Darı́o L. Goldfarb, Arpan P. Mahorowala, Gregg M. Gallatin et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 86 citations

Engineering, Electron-beam Lithography, Microscopy +18

Etching of polysilicon in inductively coupled Cl2 and HBr discharges. II. Simulation of profile evolution using cellular representation of feature composition and Monte Carlo computation of flux and surface kinetics

Arpan P. Mahorowala, Herbert H. Sawin · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2002 · 78 citations

Engineering, Monte Carlo Computation, Monte Carlo Simulator +19

Etching of polysilicon in inductively coupled Cl2 and HBr discharges. III. Photoresist mask faceting, sidewall deposition, and microtrenching

Arpan P. Mahorowala, Herbert H. Sawin · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2002 · 42 citations

Engineering, Hbr Discharges, Vacuum Device +18

Line edge roughness reduction by plasma curing photoresists

Arpan P. Mahorowala, Kuang‐Jung Chen, Ratnam Sooriyakumaran et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 41 citations

Electrical Engineering, Final Ler, Engineering +15