The Important Role of Heteroaromatics in the Design of Efficient Second-Order Nonlinear Optical Molecules:  Theoretical Investigation on Push−Pull Heteroaromatic Stilbenes

Pushkara R. Varanasi, Alex K.‐Y. Jen, Jayaraman Chandrasekhar, +2

Journal of the American Chemical Society

Optical MaterialsEngineeringNonlinear OpticsComputational ChemistryChemistry +19

Resist freezing process for double exposure lithography

Kuang-Jung Rex Chen, Wu‐Song Huang, Wai-Kin Li, +1

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Materials EngineeringMaterials ScienceEngineeringElectron-beam LithographyBeam Lithography +13

Systematic studies on reactive ion etch-induced deformations of organic underlayers

Martin Glodde, Sebastian Engelmann, Michael Guillorn, +15

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringPattern TransferOpl PatternBeam LithographyElectronic Packaging +14

Reactive ion etching of fluorine containing photoresist

Kaushal Patel, Victor Pham, Wenjie Li, +2

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Materials ScienceMaterials EngineeringEngineeringSpecific ResistancePhotochemistry +12

45-nm silicon-on-insulator CMOS technology integrating embedded DRAM for high-performance server and ASIC applications

Subramanian S. Iyer, G. Freeman, Colin J. Brodsky, +16

IBM Journal of Research and Development

EngineeringVlsi DesignEmerging Memory TechnologyComputer ArchitectureMulti-channel Memory Architecture +14

Dissolution/swelling behavior of cycloolefin polymers in aqueous base

Hiroshi Itô, Robert D. Allen, Juliann Opitz, +7

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

ArF excimer laser resists based on fluoroalcohol

Hiroshi Itô, Hoa D. Truong, Robert D. Allen, +7

Polymers for Advanced Technologies

Chemical EngineeringLaser ResistsCarboxylic AcidEngineeringOptical Properties +9

Impact of thin resist processes on post-etch LER

Arpan P. Mahorowala, Darı́o L. Goldfarb, Karen Temple, +18

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringElectron-beam LithographyResistorBeam LithographyElectronic Packaging +15

IBM-JSR 193-nm negative tone resist: polymer design, material properties, and lithographic performance

Kaushal Patel, Margaret C. Lawson, Pushkara R. Varanasi, +7

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringPolymer DesignElectron-beam LithographyMechanical EngineeringLithographic Performance +15

193nm single layer photoresists: defeating tradeoffs with a new class of fluoropolymers

Pushkara R. Varanasi, Ranee W. Kwong, Mahmoud Khojasteh, +14

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Optical MaterialsEngineeringElectron-beam LithographyMicroscopyHfa Materials +23