Ranee W. Kwong - Concepedia

Author

Ranee W. Kwong

IBM Research - Almaden

Also Known As

R. Kwong, R. W. Kwong, R.W. Kwong, Ranee Kwong, Ranee W. Kwong

Publications

278

Citations

H-Index

Concepts

All Affiliations

IBM Research - Almaden IBM (United States)IBM Research - Thomas J. Watson Research Center JSR (Japan)Micron (United States)

About

Ranee W. Kwong is an author at IBM Research - Almaden specializing in applied physics, engineering, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	6	6	175
2	Applied Physics	6	6	175
3	Chemical Engineering	4	4	76
4	Chemistry	4	4	76
5	Natural Sciences	1	1	11

Ranee W. Kwong

Publications

175

Citations

H-Index

Page 1

	Year	Citations
Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes Darı́o L. Goldfarb, Arpan P. Mahorowala, Gregg M. Gallatin, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringElectron-beam LithographyMicroscopyEtch ProcessesBeam Lithography	2004	86
Recent progress in electron-beam resists for advanced mask-making David R. Medeiros, Ari Aviram, C. R. Guarnieri, IBM Journal of Research and Development EngineeringElectron-beam LithographyAdvanced FormulationsChemistryElectron Optic	2001	40
Evaluation of a new environmentally stable positive tone chemically amplified deep-UV resist Wu‐Song Huang, Ranee W. Kwong, Ahmad D. Katnani, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyIntegrated CircuitsChemistryChemical Engineering	1994	14
Impact of thin resist processes on post-etch LER Arpan P. Mahorowala, Darı́o L. Goldfarb, Karen Temple, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyResistorBeam LithographyElectronic Packaging	2003	13
193nm single layer photoresists: defeating tradeoffs with a new class of fluoropolymers Pushkara R. Varanasi, Ranee W. Kwong, Mahmoud Khojasteh, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Optical MaterialsEngineeringElectron-beam LithographyMicroscopyHfa Materials	2005	11
Rational design in cyclic olefin resists for sub-100-nm lithography Wenjie Li, Pushkara R. Varanasi, Margaret C. Lawson, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyChemistryFluorine-containing Hfa GroupChemical Engineering	2003	11

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