Ranee W. Kwong

Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes

Darı́o L. Goldfarb, Arpan P. Mahorowala, Gregg M. Gallatin et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 86 citations

Natural Sciences, Materials Engineering, Materials Science +17

Recent progress in electron-beam resists for advanced mask-making

David R. Medeiros, Ari Aviram, C. R. Guarnieri et al. · IBM Journal of Research and Development · 2001 · 40 citations

Engineering, Materials Engineering, Materials Science +15

Evaluation of a new environmentally stable positive tone chemically amplified deep-UV resist

Wu‐Song Huang, Ranee W. Kwong, Ahmad D. Katnani et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1994 · 14 citations

Natural Sciences, Materials Science, Contrast Sensitivity +7

Impact of thin resist processes on post-etch LER

Arpan P. Mahorowala, Darı́o L. Goldfarb, Karen Temple et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 13 citations

Engineering, Manufacturing Engineering, Materials Science +17

193nm single layer photoresists: defeating tradeoffs with a new class of fluoropolymers

Pushkara R. Varanasi, Ranee W. Kwong, Mahmoud Khojasteh et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 11 citations

Natural Sciences, Materials Engineering, Materials Science +13