Ahmad D. Katnani

A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM

Alok Vaid, Bin Bin Yan, Yun Tao Jiang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 65 citations

Engineering, Electrical Engineering, Manufacturing Engineering +16

Evaluation of a new environmentally stable positive tone chemically amplified deep-UV resist

Wu‐Song Huang, Ranee W. Kwong, Ahmad D. Katnani et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1994 · 14 citations

Natural Sciences, Materials Science, Contrast Sensitivity +7

New ESCAP-type resist with enhanced etch resistance and its application to future DRAM and logic devices

Will Conley, William R. Brunsvold, Fred Buehrer et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1997 · 14 citations

Natural Sciences, Materials Engineering, Materials Science +15

Cross-sectional atom probe tomography sample preparation for improved analysis of fins on SOI

Andrew J. Martin, Weihao Weng, Zhengmao Zhu et al. · Ultramicroscopy · 2015 · 12 citations

Natural Sciences, Materials Science, Surface Science +2

Positive bilayer resists for 248- and 193-nm lithography

Ratnam Sooriyakumaran, Gregory M. Wallraff, Carl E. Larson et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1998 · 11 citations

Natural Sciences, Chemistry, Materials Science +11