T. Komoda

High performance CMOSFET technology for 45nm generation and scalability of stress-induced mobility enhancement technique

A. Oishi, Osamu Fujii, T. Yokoyama et al. · 2005 · 42 citations

Engineering, Electrical Engineering, Circuit Theory +16

Mobility improvement for 45nm node by combination of optimized stress control and channel orientation design

T. Komoda, A. Oishi, T. Sanuki et al. · 2005 · 42 citations

Engineering, Electrical Engineering, Microelectronics +12

Perpendicular anisotropy in Co-Cr films

M. Ishizuka, T. Komoda, Shuhei Tsuchimoto et al. · Journal of Magnetism and Magnetic Materials · 1983 · 23 citations

Natural Sciences, Materials Science, Physics +14

A 45nm High Performance Bulk Logic Platform Technology (CMOS6) using Ultra High NA(1.07) Immersion Lithography with Hybrid Dual-Damascene Structure and Porous Low-k BEOL

H. Nii, T. Sanuki, Y. Okayama et al. · 2006 · 22 citations

Engineering, Computer Engineering, Electrical Engineering +14

Ultra Low Voltage Operations in Bulk CMOS Logic Circuits with Dopant Segregated Schottky Source/Drain Transistors

Takenari Kinoshita, R. Hasumi, M. Hamaguchi et al. · 2006 · 18 citations

Engineering, Computer Engineering, Electrical Engineering +17