Joren Severi

Molecular Modeling of EUV Photoresist Revealing the Effect of Chain Conformation on Line-Edge Roughness Formation

Juhae Park, Sunggyu Lee, Yannick Vesters et al. · Polymers · 2019 · 26 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

SEM image denoising with unsupervised machine learning for better defect inspection and metrology

Bappaditya Dey, Sandip Halder, Kasem Khalil et al. · Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV · 2021 · 25 citations

Computing, Computer Science, Computer Vision +16

28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV lithography

Danilo De Simone, Luka Ključar, Poulomi Das et al. · 2021 · 25 citations

Engineering, Electrical Engineering, Manufacturing Engineering +9

Metrology of thin resist for high NA EUVL

Gian F. Lorusso, Christophe Béral, Janusz Bogdanowicz et al. · Metrology, Inspection, and Process Control XXXVI · 2022 · 18 citations

Engineering, Electrical Engineering, Materials Science +13

Chemically amplified resist CDSEM metrology exploration for high NA EUV lithography

Joren Severi, Gian F. Lorusso, Danilo De Simone et al. · Journal of Micro/Nanopatterning Materials and Metrology · 2022 · 15 citations · Full text

Engineering, Electrical Engineering, Materials Science +16