S. McCoy

Advanced activation of ultra-shallow junctions using flash-assisted RTP

W. Lerch, S. Paul, S. McCoy et al. · Materials Science and Engineering B · 2005 · 52 citations

Electrical Engineering, Advanced Activation, Engineering +7

A comparative study of dopant activation in boron, BF/sub 2/, arsenic, and phosphorus implanted silicon

Ali Mokhberi, Peter B. Griffin, J.D. Plummer et al. · IEEE Transactions on Electron Devices · 2002 · 46 citations

Materials Science, Materials Engineering, Electrical Engineering +15

A Comparison of Spike, Flash, SPER and Laser Annealing for 45nm CMOS

Richard Lindsay, B. J. Pawlak, J. A. Kittl et al. · MRS Proceedings · 2003 · 42 citations

Electrical Engineering, Physical Design (Electronics), Engineering +8

Loihi Asynchronous Neuromorphic Research Chip

Andrew Lines, Prasad Joshi, Ruokun Liu et al. · 2018 · 38 citations

Engineering, Vlsi Design, Computer Architecture +19

Metastable boron active concentrations in Si using flash assisted solid phase epitaxy

S. H. Jain, Peter B. Griffin, J.D. Plummer et al. · Journal of Applied Physics · 2004 · 31 citations

Engineering, Cubic Boron Nitride, Silicon On Insulator +20