Eero Haimi

Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

Oili Ylivaara, Xuwen Liu, Lauri Kilpi et al. · Thin Solid Films · 2013 · 188 citations

Natural Sciences, Materials Engineering, Materials Science +17

Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

Matti Putkonen, Markus Bosund, Oili Ylivaara et al. · Thin Solid Films · 2014 · 78 citations

Natural Sciences, Materials Engineering, Materials Science +14

Anisotropic wet chemical etching of crystalline silicon: atomistic Monte-Carlo simulations and experiments

Miguel A. Gosálvez, R. M. Nieminen, Petteri Kilpinen et al. · Applied Surface Science · 2001 · 60 citations

Engineering, Materials Engineering, Materials Science +16

Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties

Oili Ylivaara, Lauri Kilpi, Xuwen Liu et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2016 · 55 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

Optical and structural properties of nanocrystalline anatase (TiO2) thin films prepared by non-aqueous sol-gel dip-coating

Eero Haimi, H. Lipsonen, Juha Larismaa et al. · Thin Solid Films · 2011 · 45 citations

Natural Sciences, Materials Engineering, Materials Science +16