Concepedia

Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

Matti Putkonen, Markus Bosund, Oili Ylivaara, Riikka L. Puurunen, Lauri Kilpi, Helena Ronkainen, Sakari Sintonen, Saima Ali, Harri Lipsanen, Xuwen Liu,

Thin Solid Films · 2014 · 78 citations · 33 references

DOI

Concepts

References

33

An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experiments

W. C. Oliver, George M. Pharr · Journal of materials research/Pratt's guide to venture capital sources · 1992 · 26.6K citations

, , +16

Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

Riikka L. Puurunen · Journal of Applied Physics · 2005 · 2.6K citations

, , +17

Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

Ville Miikkulainen, Markku Leskelä, Mikko Ritala et al. · Journal of Applied Physics · 2013 · 1.4K citations

, , +17

Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

Harald B. Profijt, Stephen E. Potts, M. C. M. van de Sanden et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2011 · 881 citations · Full text

, , +15

Investigations on hydrophilic and hydrophobic silicon (100) wafer surfaces by X-ray photoelectron and high-resolution electron energy loss-spectroscopy

M. Grundner, H.‐E. Jacob · Applied Physics A · 1986 · 411 citations

, , +17