Oili Ylivaara

Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

Oili Ylivaara, Xuwen Liu, Lauri Kilpi et al. · Thin Solid Films · 2013 · 183 citations

Materials Science, Materials Engineering, Aluminium Nitride +10

Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD”

Esko Ahvenniemi, Andrew R. Akbashev, Saima Ali et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2016 · 94 citations · Full text

Engineering, Thin Film Process Technology, Chemistry +17

Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

Matti Putkonen, Markus Bosund, Oili Ylivaara et al. · Thin Solid Films · 2014 · 75 citations

Materials Science, Engineering, Silicon On Insulator +8

Modeling growth kinetics of thin films made by atomic layer deposition in lateral high-aspect-ratio structures

Markku Ylilammi, Oili Ylivaara, Riikka L. Puurunen · Journal of Applied Physics · 2018 · 68 citations · Full text

Materials Science, Materials Engineering, Epitaxial Growth +13

Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties

Oili Ylivaara, Lauri Kilpi, Xuwen Liu et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2016 · 54 citations · Full text

Thin Film Physics, Engineering, Surface Nanotechnology +21