Oili Ylivaara

Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

Oili Ylivaara, Xuwen Liu, Lauri Kilpi et al. · Thin Solid Films · 2013 · 188 citations

Natural Sciences, Materials Engineering, Materials Science +17

Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD”

Esko Ahvenniemi, Andrew R. Akbashev, Saima Ali et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2016 · 95 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +13

Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

Matti Putkonen, Markus Bosund, Oili Ylivaara et al. · Thin Solid Films · 2014 · 78 citations

Natural Sciences, Materials Engineering, Materials Science +14

Modeling growth kinetics of thin films made by atomic layer deposition in lateral high-aspect-ratio structures

Markku Ylilammi, Oili Ylivaara, Riikka L. Puurunen · Journal of Applied Physics · 2018 · 71 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties

Oili Ylivaara, Lauri Kilpi, Xuwen Liu et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2016 · 55 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17