Markus Bosund

Properties of AlN grown by plasma enhanced atomic layer deposition

Markus Bosund, Timo Sajavaara, Mikko Laitinen et al. · Applied Surface Science · 2011 · 124 citations

Materials Science, Aluminium Nitride, Engineering +8

Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

Matti Putkonen, Markus Bosund, Oili Ylivaara et al. · Thin Solid Films · 2014 · 75 citations

Materials Science, Engineering, Silicon On Insulator +8

Atomic Layer Deposition Al₂O₃ Coatings Significantly Improve Thermal, Chemical, and Mechanical Stability of Anodic TiO₂ Nanotube Layers

Raúl Zazpe, Jan Přikryl, V. Gärtnerová et al. · Langmuir · 2017 · 58 citations · Full text

Atomic layer deposited TiO2 films in photodegradation of aqueous salicylic acid

Sari Vilhunen, Markus Bosund, Marja‐Leena Kääriäinen et al. · Separation and Purification Technology · 2008 · 52 citations

Chemical Engineering, Engineering, Photodegradation +8

GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride

Markus Bosund, P. Mattila, Abuduwayiti Aierken et al. · Applied Surface Science · 2010 · 47 citations

Compound Semiconductor, Applied Physics, Gaas Surface Passivation