Rainer Loesing

Hafnium oxide gate dielectrics on sulfur-passivated germanium

Martin M. Frank, Steven J. Koester, M. Copel et al. · Applied Physics Letters · 2006 · 126 citations

Natural Sciences, Materials Engineering, Materials Science +17

Strained Si Channel MOSFETs with Embedded Silicon Carbon Formed by Solid Phase Epitaxy

Yaocheng Liu, Oleg Gluschenkov, Jinghong Li et al. · 2007 · 42 citations

Engineering, Electrical Engineering, Materials Science +17

Activation of Implanted n-Type Dopants in Ge Over the Active Concentration of 1×10[sup 20] cm[sup −3] Using Coimplantation of Sb and P

Jeehwan Kim, Stephen W. Bedell, Siegfried Maurer et al. · Electrochemical and Solid-State Letters · 2009 · 38 citations

Engineering, Materials Engineering, Materials Science +17

Fully depleted extremely thin SOI technology fabricated by a novel integration scheme featuring implant-free, zero-silicon-loss, and faceted raised source/drain

Kangguo Cheng, A. Khakifirooz, P. Kulkarni et al. · Symposium on VLSI Technology · 2006 · 31 citations

Engineering, Electrical Engineering, Materials Science +17

Novel Enhanced Stressor with Graded Embedded SiGe Source/Drain for High Performance CMOS Devices

M. Ieong, J. Sudijono, J.-H. Ku et al. · 2006 · 25 citations

Engineering, Electrical Engineering, Materials Science +15