A.H. Perera

Trench isolation for 0.45 μm active pitch and below

A.H. Perera, Jung‐Hui Lin, Yao-Ching Ku et al. · 2002 · 23 citations

Aeroacoustics, Electrical Engineering, Semiconductor Device +13

Anisotropic Reactive Ion Etching of Aluminum Using Cl2, BCl3, and  CH 4 Gases

J. Lutze, A.H. Perera, J.P. Krusius · Journal of The Electrochemical Society · 1990 · 23 citations

Aluminium Nitride, Engineering, Electron-beam Lithography +17

A high-performance 0.5- mu m BiCMOS technology for fast 4-Mb SRAMs

J.D. Hayden, T.C. Mele, A.H. Perera et al. · IEEE Transactions on Electron Devices · 1992 · 19 citations

Low-power Electronics, Electrical Engineering, Collector-emitter Breakdown Voltage +15

A versatile 0.13 μm CMOS platform technology supporting high performance and low power applications

A.H. Perera, B. Smith, N. Cave et al. · 2002 · 18 citations

Low Power Applications, Engineering, Vlsi Design +17

A high performance 0.5 mu m BiCMOS triple polysilicon technology for 4 Mb fast SRAMs

T.C. Mele, J.D. Hayden, F.W. Walczyk et al. · 2002 · 17 citations

Low-power Electronics, Electrical Engineering, Engineering +14